Method of correcting lighting patterns

摘要

The method involves correcting an illumination image during a lithographic process in which a substrate is exposed to light according to the illumination pattern to transfer the transfer image (I) to the substrate. The visible design of the desired pattern is divided into several sections corresp. to a rule and several evaluation points are associated with each section. A transfer pattern is computed using a simulation, then the substrate is illuminated according to the desired pattern (P). The distance is computed between each evaluation point in each section of the desired pattern and a position corresp. to each transfer image evaluation point, after which the substrate is illuminated. A corrected image pattern is determined by inserting the distance into a fixed evaluation function, whereby each section position is corrected according to an output value of the evaluation function.