Optical near-field method for microlithography and microlithography devices using this method,申请号EP19900402617-传众专利搜索

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发明名称	Optical near-field method for microlithography and microlithography devices using this method
摘要
申请公布号	EP0419369(B1)	申请公布日期	1998.04.29
申请号	EP19900402617	申请日期	1990.09.21
申请人	SIM (SOCIETE D'INVESTISSEMENT DANS LA MICROSCOPIE) SA	发明人	DE FORNEL, FREDERIQUE;GOUDONNET, JEAN-PIERRE;MANTOVANI, JAMES
分类号	G03F7/20;H01J37/304;H01L21/027;(IPC1-7):G03F7/20	主分类号	G03F7/20
代理机构		代理人
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