| 摘要 |
<p>Apparatus for supplying a jet of chemical vapor at a substantially constant rate comprises a crucible for containing a quantity of chemical, a hollow needle, a flow path from the crucible to the hollow needle, a Peltier element in thermal communication with the crucible, and a temperature control circuit responsive to temperature in the crucible for powering the Peltier element so as to maintain temperature of the crucible substantially constant. The temperature control circuit powers the Peltier element so as to maintain temperature of the crucible below (or above) ambient temperature. The apparatus is useful in a system for modifying an integrated circuit specimen which further comprises a vacuum chamber and an ion-optical column for directing a focused ion beam at an integrated circuit specimen within the vacuum chamber. Control of vapor pressure, and thus flow rate, offers improved control over FIB processing of integrated circuit specimens. <IMAGE></p> |
