Semiconductor device with intermetal dielectric and method of making

摘要

A semiconductor device comprising first and second interconnect levels (14) and (16) is described. Mixed polymeric intermetal dielectrics (46), (48) and (50) are used to separate conductive elements (22), (24), (26), (36) and (38), respectively. The intermetal dielectric bodies (46), (48) and (50) comprise a mixture of per-fluorinated and non-fluorinated parylene.