| 摘要 |
PURPOSE:To positively accelerate the mixing of a gas flowing in a reaction tube before the gas reaches a substrate and grow a uniform grown film by providing the inside of the reaction tube with a guide plate for agitating a gas flow. CONSTITUTION:Standing from the inner wall of a reaction tube 10, guide plates 11 form a signal configuration in the longitudinal direction of the reaction tube 10 and are provided from the side of the gas introducing port 2 of the reaction tube 10 to a position before the arranging position of a substrate W. The guide plates 11 guide a gas on the lower side of the tube 10 to the upper side and the gas on the upper side to the lower side for the gas introduced from the gas introducing pipe 2 and flowing in the reaction tube 10. Thus, even when the introduced gas is composed of a variety of types and the differences in weight are present in the gases, the gases are sufficiently mixed before they reach the position of the substrate W and upper and lower mixing ratios are approximately equal to each other in the position of the substrate W. Therefore, even when there is an inclination in the arrangement of the substrate W during a growth, a film grown by using a vapor growth apparatus described above, has a uniform quality in any position on the substrate W.
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