发明名称 Electrostatic chuck with conformal insulator film
摘要 An electrostatic chuck (20) for holding a substrate (75) comprises (i) a base (80) having an upper surface (95) with grooves (85) therein, the grooves (85) sized and distributed for holding coolant for cooling a substrate (75), and (ii) a substantially continuous insulator film (45) conformal to the grooves (85) on upper surface (95) of the base (80). The base (80) can be electrically conductive and capable of serving as the electrode (50) of the chuck (20), or the electrode (50) can be embedded in the insulator film (45). The insulator film (45) has a dielectric breakdown strength sufficiently high that when a substrate (75) placed on the chuck (20) and electrically biased with respect to the electrode (50), electrostatic charge accumulates in the substrate (75) and in the electrode (50) forming an electrostatic force that attracts and holds the substrate (75) to the chuck (20). Preferably the chuck (20) is fabricated using a pressure forming process, and more preferably using a pressure differential process.
申请公布号 US5745331(A) 申请公布日期 1998.04.28
申请号 US19950381786 申请日期 1995.01.31
申请人 APPLIED MATERIALS, INC. 发明人 SHAMOUILIAN, SHAMOUIL;SOMEKH, SASSON;LEVINSTEIN, HYMAN J.;BIRANG, MANOOCHER;SHERSTINSKY, SEMYON;CAMERON, JOHN F.
分类号 B23Q3/15;H01L21/683;H02N13/00;(IPC1-7):H02N13/00 主分类号 B23Q3/15
代理机构 代理人
主权项
地址