TWO LUMINOUS FLUXES INTERFERING EXPOSURE METHOD, MANUFACTURE OF ARRAY TYPE SEMICONDUCTOR LIGHT SOURCE, AND ARRAY TYPE SEMICONDUCTOR LIGHT SOURCE

摘要

PROBLEM TO BE SOLVED: To provide a two luminous fluxes interfering exposure method capable of changing the pitch of a periodic stripe grooves in the direction of the stripe on a substrate plane. SOLUTION: This method is the manufacturing method for periodic stripes for irradiating a substrate 17 with two luminance fluxes and exposing it by an interference fringes pattern. The wavefronts of two luminous fluxes are cylindrical surfaces. In fundamental arrangement that the respective central axes of two cylindrical surfaces are parallel with each other and the central axis is parallel with a substrate to be exposed, the substrate 17 is exposed by the interference fringes pattern under the condition that the substrate 17 is inclined and it is not parallel with the central axis. The respective central axes of the cylindrical surfaces may be somewhat inclined.