发明名称 ANTIBACTERIAL LOW IRRITANT COSMETIC MATERIAL
摘要 PROBLEM TO BE SOLVED: To obtain a stable cosmetic material low in irritation to skin and excellent in antibacterial effect, and not polluted by microorganisms such as bacterial and molds by blending a specific plant extract with a specific antiseptic fungicide as a combination. SOLUTION: This antibacterial low irritant cosmetic material contains an extract of an inner seed skin of a ginkgo, and one kind or two or more kinds selected from the group of a para-oxybenzoic acid derivative, phenoxyethanol, photosensitizer 101 (platonin), 201 (pionin), 401 (luminex), hinokithiol, an N-long chain acyl basic amino acid derivative and an acid adduct thereof and zinc oxide. Especially as the N-long chain acyl basic amino acid derivative and the acid adduct thereof, a compound of formula I, II, III [RCO is a fatty acid residue; X is NH2 , OCH3 , etc.; (n) is 3, 4] is preferable. The blending amount of the extract of inner seed skin of the ginkgo is 0.001-10wt.% and those of e.g. an ester of para-oxybenzoic acid and phenoxyethanol are 0.01-0.2wt.% and 0.05-0.3wt.% respectively.
申请公布号 JPH10109923(A) 申请公布日期 1998.04.28
申请号 JP19960283415 申请日期 1996.10.04
申请人 NOEVIR CO LTD 发明人 YAMAMOTO YASUYUKI;IMAHORI ATSUKO
分类号 A61K8/19;A61K8/00;A61K8/04;A61K8/27;A61K8/30;A61K8/33;A61K8/34;A61K8/42;A61K8/44;A61K8/49;A61K8/96;A61K8/97;A61K36/00;A61P17/00;A61P31/04;A61Q1/00;A61Q1/10;A61Q1/12;A61Q5/02;A61Q19/00 主分类号 A61K8/19
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