| 摘要 |
PROBLEM TO BE SOLVED: To provide a device which is a development processing device or etching processing device to execute processing by injecting a processing liquid from a nozzle (spray) in a production stage for photomasks and obviates the occurrence of the sag of the processing liquid after stopping the injection of the processing liquid from the nozzle (spray). SOLUTION: This fluid injection device 100 has a first piping 120 for force feeding and supplying fluid, a first control valve 130 for controlling the passage of the fluid from the first piping by opening and closing the passage, a second piping 122 for supplying the liquid discharged through the first control valve to the nozzle 110 and injects the fluid from the nozzle 110. The second piping 122 between the first control valve 130 and the nozzle 110 is branched and is provided with a pressure reduction part 140 via a second control valve 132 by connecting the part. At the time of stopping the injection of the fluid, the second control valve 132 is opened simultaneously with closing of the first control valve 130 or after closing of the first control valve 130 to such the fluid via the second piping 122 to the reduced pressure part 140 side, by which the fluid remaining in the nozzle 110 is discharged outside. |
