发明名称 PRODUCTION SYSTEM FOR MANUFACTURING SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a production system for manufacturing a semiconductor device in which accurate process control is possible by using a plurality of process flows for one kind. SOLUTION: One process flow is assigned to one lot, and control is performed. In this production system for manufacturing a semiconductor device the following are installed; a means for forming process flows in which processing conditions of a wafer for forming a semiconductor device via a plurality of processes are described, and a means for wafer-processing one kind of the semiconductor device every lot, on the basis of the process flows. The process flows are assigned to each lot. Thereby, addition and elimination of a condition change process, flow division and redoing can be freely performed for each lot. When the processing of a lot does not succeed and processing is performed again, a process can be added only for the lot. Assignment of a division process flow condition or the liek can be defined for each lot.
申请公布号 JPH10106917(A) 申请公布日期 1998.04.24
申请号 JP19960279864 申请日期 1996.10.02
申请人 TOSHIBA CORP 发明人 FUKUDA ETSUO;OKUYA HIDEHIRO
分类号 H01L21/02;G05B15/02;G05B19/418 主分类号 H01L21/02
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