| 摘要 |
PROBLEM TO BE SOLVED: To suppress the inactivation of active radicals generated by irradiation with laser light and to obtain a resist capable of maintaining high sensitivity by incorporating a specified radical protecting compd. SOLUTION: At least one kind of radical protecting compd. selected from among phosphorous ester compds. and arom. compds. each having an N,N- dimethylamino group bonding to an arom. ring forming C atom is incorporated into a system consisting of a photosetting resin having photosensitive groups capable of crosslinking or polymn. by irradiation with light and a photopolymn. initiator effective to visible radiation or further contg. an ethylenic unsatd. compd. to obtain the objective photopolymerizable compsn. The photosensitive groups of the photosetting resin are acryloyl, methacryloyl, cinnamoyl, etc., the pref. number average mol.wt. of the resin is 1,000-100,000, especially 3,000-50,000 and the pref. amt. of the photosensitive groups is 0.2-5mol, especially 3-5mol per 1kg of the resin.
|
