发明名称 XY STAGE POSITIONING DEVICE
摘要 <p>PROBLEM TO BE SOLVED: To perform high-precison positioning without using an expensive length measuring means or increasing mechanical machining precision. SOLUTION: On a base 1, an X stage 11 and a Y stage 12 which move in an X direction and a Y direction are provided and on the reverse surface of aθstage 13 provided on the X stage 11, a positioning scale plate 21 given positioning marks in a grid pattern is fitted. To position the X and Y stages 11 and 12, a detecting device 22 detects the position of a positioning mark and after the position is stored, the X and Y stages 11 and 12 are moved by specific quantities. Then the position of the positioning mark is detected and a position where the positioning mark should be after movement is calculated from the distance between positioning marks on the positioning scale plate 21 and the said movement quantity, thereby moving the X and Y stages 11 and 12 so that the positioning mark is at the position after the movement.</p>
申请公布号 JPH10105242(A) 申请公布日期 1998.04.24
申请号 JP19960260411 申请日期 1996.10.01
申请人 USHIO INC 发明人 TANAKA YONETA
分类号 B23Q1/00;B23Q1/28;B23Q1/62;G03F7/20;G05D3/00;G05D3/12;H01L21/027;H01L21/68;(IPC1-7):G05D3/00 主分类号 B23Q1/00
代理机构 代理人
主权项
地址