THINNER COMPOSITION FOR WASHING PHOTORESIST IN SEMICONDUCTOR PRODUCING PROCESS

摘要

PROBLEM TO BE SOLVED: To obtain a thinner compsn. used for washing a photoresist in a semiconductor producing process by removing the unnecessary photoresists on a photoresist layer close to the edge of a wafer and on the rear side of the wafer when the photoresist layer is used as a mask. SOLUTION: This thinner compsn. consists of a mixture of ethyl lactate with ethyl-3-ethoxy propionate and is preferably prepd. by a mixture of ethyl lactate with ethyl-3-ethoxy propionate andγ-butyrolactone. When this thinner compsn. is used, the yield of a semiconductor device can be enhanced because a photoresist on the edge and rear side of a wafer is rapidly and efficiently removed. Since the residual photoresist sticking to the rear side of the wafer is perfectly removed, the wafer can be reused and the wafer can be used economically.