| 摘要 |
PROBLEM TO BE SOLVED: To provide an inspection apparatus by which the positional relationship of a flaw part existing on an object to be inspected can be fetched as normalized coordinate data. SOLUTION: An inspection apparatus is provided with an illumination device 18 by which the surface of a semiconductor wafer 2 held on a macro base 4 is irradiated with illumination light for inspection, with a rotating pulse motor 6 and X-axis and Y-axis rocking pulse motors 8, 10 which turn and rock the macro base, with a laser spot pen 20 by which a flaw part A confirmed in the rotating operation and the rocking operation of the semiconductor wafer during the irradiation of the illumination light for inspection is spot-irradiated with a laser beam for indication, with an angle detection means which detects the rotating angle and the rocking angle of the semiconductor wafer, with a CCD camera 24 by which image light generated from the flaw part can be fetched and with an image processor 26 by which the positional relationship of the flaw part can be fetched as coordinate data on the basis of image data from the CCD camera and on the basis of detection data from the angle detection means. |
