ALIGNER AND SEMICONDUCTOR MANUFACTURING METHOD USING THE ALIGNER

摘要

PROBLEM TO BE SOLVED: To prevent nonuniformity of exposure which is to be caused by attenuation of charged particle storage ring radiant ray or the like. SOLUTION: An X ray L1 such as charged particle storage ring radiant ray is magnified in the Y axis direction by a convex mirror 5, and an exposed field angle S1 of a wafer W1 is exposed. Change of intensity of the X ray L1 with time is detected by an intensity sensor 6. Nonuniformity of exposure which is to be caused by attenuation of X ray L1 during exposure is evaded by correcting the timing and the moving velocity when the rear edge 12a of a shutter 10 is closed.