| 摘要 |
PROBLEM TO BE SOLVED: To uniformly illuminate the surface of an object, and an exposure center light flux is made incident vertical to the surface to be illuminated by a method in which the illumination distribution of the aperture part of a masking blade is measured, a part of an illumination system optical element is driven by an optical axis adjusting system based on an illumination signal, and the illumination distribution of the aperture part is adjusted. SOLUTION: The photosensor of an illumination measuring system 201 measures the degree of illumination by scanning on the whole area of illumination of the aperture region of a masking blade 6 when an illumination measuring operation is conducted. The condition of incidence of a beam of light to an optical integrator 4 is detected from the illumination distribution at the aperture part of a masking blade 6 measured by the illumination measuring system 201. By adjusting at least an optical element, which constitutes an illumination system, by operating an optical axis adjusting/control system 105 in the direction orthogonally intersecting with the optical axis based on the detected condition of incidence, the incident light to an optical integrator 4 becomes symmetrical to the optical axis or becomes the state approximate to symmetry. |
