| 摘要 |
PROBLEM TO BE SOLVED: To provide a method of manufacturing masking substrate which form the necessary and minimum width of a strut. SOLUTION: This method prepares a substrate formed by laminating at least a silicon layer 3 and a layer composed of membrane material, in order. A silicon oxide layer 5 is formed on the silicon layer 3. A specific pattern 6 is formed on the silicon oxide layer 5. The silicon layer 3 is etched by a dry etching method capable of etching in the vertical direction, conforming to the pattern 6 of the silicon oxide layer 5. |
