| 摘要 |
PROBLEM TO BE SOLVED: To decrease the process number and to improve productivity by forming patterns of optical waveguide elements in such a manner that the connecting end faces of optical waveguide elements are inclined to cross scribe lines on a wafer. SOLUTION: A photometer is disposed on a silicon wafer 10 with the phtomaster rotated by a specified angle in the plane so as to form many patterns 2 of optical waveguide elements on the wafer 10 by photoetching. Namely, the end part of each optical waveguide pattern 12 crosses the scribe line 16. As for the wafer 10, a GaAs wafer or LiNbO3 wafer is used. The optical waveguide element pattern 12 is used for a silica waveguide element, polymer waveguide element or laser diode. Thereby, the optical waveguide element pattern 2 is formed as inclined by a specified angle from horizontal and vertical scribe lines 16, 18 on the wafer 10. The angle of the optical waveguide element pattern 12 is controlled to larger than the numerical aperture of the optical waveguide element and optical fiber, and usually 1 to 20 deg.C. |
