ANTIREFLECTING ANTISTATIC FILM AND DISPLAY DEVICE USING IT

摘要

PROBLEM TO BE SOLVED: To decrease residual stress in an upper lower refractive index layer and to obtain an antireflecting antistatic film having high strength by specifying the concn. of alkyl groups in the low refractive index layer. SOLUTION: This antireflecting antistatic film consists of a transparent antistatic layer containing conductive ultrafine particles and a low refractive index layer on the antistatic layer. This low refractive index layer is produced from a silica sol soln. containing silicon alkoxide expressed by R3 -Si-Cn H2n+1 having lower alkyl groups bonded to the Si skeleton and has lower refractive index than that of the antistatic layer. The concn. of alkyl groups in the low refractive index layer is 7 to 30wt.%. In formula, R is an alkoxy group and n is an integer 1 to 4. The silicon alkoxide of the formula as the material of the low refractive index layer has a silica skeleton and alkyl groups such as methyl groups and ethyl groups directly bonded to Si. As for the alkoxy group expressed by R, ethoxy groups are preferable. In this case, the residual stress in the low refractive index layer of the antireflecting antistatic film is <=5dyn/cm<2> .