Herstellungsverfahren für Röntgenstrahl-Belichtungsmaske und Vorrichtung zur Spannungsmessung dünner Schichten
摘要
An X-ray mask can be manufactured by forming an X-ray transmitting thin film (12) on a mask support (11), forming an X-ray absorber thin film (14) on the X-ray transmitting thin film (12), and patterning the X-ray absorber thin film (14) with a desired pattern to form an X-ray absorber pattern. Prior to the patterning, at least one inert element with an atomic number greater than that of neon is ion-implanted in the X-ray absorber thin film (14).
申请公布号
DE69031576(T2)
申请公布日期
1998.04.23
申请号
DE1990631576T
申请日期
1990.03.16
申请人
KABUSHIKI KAISHA TOSHIBA, KAWASAKI, KANAGAWA, JP
发明人
HORI, MASARU, C/O INTELLECTUAL PROPERTY DIVISION, TOKYO 105, JP;ITOH, MASAMITSU C/O INTELLECTUAL PROPERTYDIVISION, TOKYO 105, JP