| 摘要 |
PROBLEM TO BE SOLVED: To narrow the clearance between electrodes even if a vapor-deposition mask is used without the mask being affected by an aspect ratio. SOLUTION: A metallic strip electrode is formed on an org. light emitting layer formed on a transparent substrate via a transparent electrode by the use of a vapor-deposition mask 11. In this case, many small circular holes 13 are formed in the mask 11 at a specified space S1 , the mask 11 is moved in the direction orthogonal to the line of the small holes 13, and deposition is carried out. Accordingly, only the formation of the small holes 13 in the mask 11 at a specified space S1 is necessary, a slender slit need not be formed unlike the conventional vapor-deposition mask, the workability of the mask 11 is improved, the mask is not affected by the aspect ratio so much as compared with the conventional one having a slit, the mechanical strength is ensured, the mask 11 can be thinned, hence the space S1 between the small holes 13 is made narrower than that of conventional way, and the clearance between the electrodes is also narrowed. |
