发明名称 Stacked capacitors for integrated circuit devices and related methods
摘要 A method for fabricating a capacitor on a substrate includes the steps of forming an insulating layer on the substrate, and forming the first plate electrode on the insulating layer. A first dielectric layer is then formed on the plate electrode, and a first common storage electrode is formed on the first dielectric layer. A contact hole is then formed through the insulating layer, the first plate electrode, the first dielectric layer, and the first common storage electrode, thereby exposing a predetermined portion of the substrate. A first spacer is formed on a sidewall of the contact hole, and a conductive plug is formed in the contact hole extending from the substrate to the first common storage electrode.
申请公布号 US5742472(A) 申请公布日期 1998.04.21
申请号 US19960674883 申请日期 1996.07.03
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 LEE, MYOUNG-BUM;LEE, HYEON-DEOK
分类号 H01L27/04;H01L21/02;H01L21/822;H01L21/8242;H01L27/108;(IPC1-7):H01G4/06 主分类号 H01L27/04
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