| 摘要 |
<p>PROBLEM TO BE SOLVED: To mitigate a load brought to bear on a detoxifying device and reduce the amount of an exhaust gas to leak into an atmosphere by turning an unreacted gas containing an oxidative gas to be exhausted from a CVD device so that a gas phase reaction is generated, then removing a solid particle formed by the reaction and supplying the residual gas to the detoxifying device. SOLUTION: In a CVD device 1, SiH4 gas and O2 gas are supplied into a port 2 respectively and are heated by a high frequency heating device 7 to undergo a gas phase reaction and in turn, form an SiO2 film on a silicon wafer 4. In this case, an unreacted gas is exhausted from an exhaust aperture 12. However, this exhaust gas is tengentially introduced into a cyclone 13 to be turned around a center cylinder 15 and a chemical reaction is generated by this turning. Further, an SiO2 solid particle is made remote from the center by a centrifugal force and is caused to fall to a recovery part 16 to be recovered. On the other hand, the residual gas finds its way into a packed layer 22 from the gas inlet 29 of a scrubber 18 as a detoxifying device, and a liquid such as water is atomized to fall into a liquid tank 26 and then is stored there.</p> |
