| 摘要 |
PURPOSE:To obtain a material for vacuum deposition of a Ta2O5 deposit stably working by subjecting a specified ratio of powder mixture of Ta2O5 and metallic Ta to compacting and sintering. CONSTITUTION:Powdery Ta2O5 and powdery metallic Ta by 4 to 55wt.% to the above Ta2O5 are mixed. This mixed powder is compacted into a desired shape and is thereafter heated, e.g. to 1500 deg.C in vacuum and is sintered to manufacture the material for vacuum deposition for forming a Ta2O5 thin deposit by a vacuum vapor deposition method. At the time of forming a Ta2O5 thin deposit by executing heating, melting and evaporating by the irradiation of electron beams or the like in vacuum, the material for Ta2O5 deposition is melted in a short time, and the Ta2O5 thin deposit can stably be formed without the generation of a phenomenon such as sudden boiling. |
