首页
产品
黄页
商标
征信
会员服务
注册
登录
全部
|
企业名
|
法人/股东/高管
|
品牌/产品
|
地址
|
经营范围
发明名称
PROCESS OF FABRICATING BI-CMOS INTEGRATED CIRCUIT DEVICE
摘要
申请公布号
KR0131431(B1)
申请公布日期
1998.04.15
申请号
KR19940013309
申请日期
1994.06.14
申请人
NEC CO.,LTD
发明人
SUZUKI, HISAMITSU
分类号
H01L27/06;H01L21/8244;H01L21/8249;H01L27/11;(IPC1-7):H01L27/08
主分类号
H01L27/06
代理机构
代理人
主权项
地址
您可能感兴趣的专利
Improvements in and relating to metal seals for wire and the like
File plane
Improvements in or relating to incandescent electric lamps
Improvements in and relating to machines for boring metal
Improvements in the cutting cylinders of lawn mowers
Improvements in disposable sanitary napkins
Method of recording sound by means of a ray of electrons
Improvements in or relating to feeding means for a paper or metal band or strip, electric wire, sound film or like continuous material
Improvements in carpet sweepers and cleaners
Improvements in or relating to electrically-conducting coatings
Knitted lining for rubber footwear and method of making same
Side wind protection for railway systems
Method of making radiator elements
Hay unloading apparatus
Dispensing apparatus
Bushing remover
Tractor cultivator
Method of producing mixed fertilizers
Automatic parallel connecting system
Glass holder