| 摘要 |
An exposure apparatus for transferring a pattern onto a surface of the substrate by exposure includes a detector for indirectly detecting a light quantity on the substrate surface on the basis of an extracted portion of exposure light and a transmission factor stabilizer for projecting exposure light to an optical element disposed between the substrate surface and a position where the portion of the exposure light is extracted during a non-exposure period in which an actual exposure process is not performed, so as to stabilize the transmission factor of the optical element. |
