Polishing machine

摘要

A polishing machine of the present invention is capable of uniformly polishing a member (20) to be polished with high flatness, and polishing cloth, which is employed in the polishing machine, can be uniformly abraded. In the polishing machine, a polishing plate (10) is capable of rotating. A supporting table (22) rotatably supports the polishing plate (10). A rotary driving mechanism (25) is mounted on the supporting table (22), and it (25) rotates the polishing plate (10). A base (30) supports the supporting table (22). An orbital driving mechanism (32) moves the supporting table (22) along a circular orbit without spinning about its own axis.