BEST FOCAL POINT DETECTING METHOD FOR PHOTOLITHOGRAPHIC PROCESS AND RETICLE USED THEREFOR

摘要

PROBLEM TO BE SOLVED: To easily and accurately detect the best focal point. SOLUTION: A resist is exposed by varying the set focus value of an aligner by a fixed width by using a reticle carrying a focus control pattern 1 in which one vertexes of two triangular patterns 1a and 1b are brought into point-contact with each other. When the resist is developed thereafter, a plurality of resist patterns to which the pattern 1 is transferred in different resolution states is formed. Then the appearance of the resist patterns are inspected with an optical microscope and the set focus value of the aligner when the vertexes of the two triangles are brought into point-contact with each other is compared with the best focal point.