| 摘要 |
PROBLEM TO BE SOLVED: To provide a means for prolonging the life of the constituting members of a substrate treating device. SOLUTION: This substrate treating device 5 includes a treating chamber 10 which has inside surfaces at least partly covered with carbon-based films 100. These carbon-based films protect the inside surfaces of the chamber against etching gases and the other reactive materials used during the substrate treatment. The films also prohibit the accumulation of residues, prevent the generation of particulates and hermetically seal the impurities existing within the coated materials. In a more preferable embodiment, the carbon-based films are films of either of diamond or diamond-like carbon(DLC). This invention also covers a method of protecting the inside surfaces of the treating chamber against the reactive materials used during the substrate treatment by covering at least part of these surfaces with such carbon-based films.
|
