发明名称 |
Method for producing a substrate having crystalline silicon nuclei for forming a polysilicon thin film |
摘要 |
A method for producing a substrate for forming a polysilicon thin film by forming an amorphous silicon film of a thickness not more than 200 ANGSTROM , irradiating excimer laser light onto the amorphous silicon film to crystallize silicon particles contained in the amorphous silicon film; and irradiating the amorphous silicon film with hydrogen radicals to etch the amorphous silicon film.
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申请公布号 |
US5739043(A) |
申请公布日期 |
1998.04.14 |
申请号 |
US19960599652 |
申请日期 |
1996.02.12 |
申请人 |
KANEGAFUCHI CHEMICAL INDUSTRY CO., LTD. |
发明人 |
YAMAMOTO, KENJI |
分类号 |
C03C17/22;(IPC1-7):H01L21/268 |
主分类号 |
C03C17/22 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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