| 摘要 |
<p>PROBLEM TO BE SOLVED: To attain uniform development without causing irregular development in a shower developing process and to increase the developing speed by applying a photosensitive resin on a substrate, dipping the substrate subjected to a pattern exposing, and carrying the substrate while dipping in a developer which flows like a stream. SOLUTION: The substrate to be developed is developed by allowing a developer 5 to flow like a stream from a liquid supply tank 6 to a liquid receiving tank 7 and dipping and carrying the substrate in the liquid in the direction opposite to the flowing direction of the developer 5. Namely, the substrate carried from preceding processes of application of a photosensitive color transparent resin and pattern exposure of the resin is surely engaged and fixed by a supporting arm 3 to plural conveyers guided by a guide belt 4, and guided by the guide belt 4 in such a manner that the substrate up above the water surface of the developer 5 is introduced under the water, namely dipped in the developer 5. The substrate is horizontally carried in the direction opposite to the flow of the stream of the developer 5.</p> |
