发明名称 PRODUCTION OF THREE-DIMENSIONAL PHOTOMASK
摘要 <p>PROBLEM TO BE SOLVED: To produce a three-dimensional photomask with high accuracy and good durability even on a three-dimensional base body of a complicated shape by forming a temporary mold by using a molding die, forming a light-shielding pattern on the body, and bringing the part where the light-shielding pattern is formed into contact with a molten or softened light-transmitting resin to transfer the light-shielding pattern to the resin. SOLUTION: A temporary mold 3A (or 3B) is formed by using a molding die to form a base body having three-dimensional faces where circuits are to be formed. A light-shielding pattern P according to circuits is formed on the faces of the temporary mold 3A (3B) corresponding to the three-dimensional faces of the base body where the circuits are to be formed. The region of the temporary mold 3A (3B) where the light-shielding pattern P is formed is brought into contact with a molten or softened lighttransmitting resin 8A (8B), and the resin 8A (8B) is hardened to transfer the light-shielding pattern P to the resin 8A (8B). Then the temporary mold 3A (3B) is removed. In this process, another die for the temporary mold 3A (3B) is not required but the molding die to form the base body is used to form the temporary mold 3A (3B) by injection molding or the like.</p>
申请公布号 JPH1097054(A) 申请公布日期 1998.04.14
申请号 JP19960249793 申请日期 1996.09.20
申请人 OTSUKA CHEM CO LTD 发明人 TABUCHI AKIRA;ISHII YOSHIAKI
分类号 B29C33/52;B29C69/00;G03F1/00;G03F1/50;G03F1/68;H05K3/00;H05K3/06 主分类号 B29C33/52
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