| 摘要 |
PROBLEM TO BE SOLVED: To provide a photosensitive compsn. having high sensitivity and high resolving power, giving a resist pattern which does not thin during the time from exposure to heating and ensuring slight deterioration of profile by incorporating a specified compd. as a compd. generating sulfonic acid when irradiated with active light or radiation. SOLUTION: This photosensitive compsn. contains a resin having groups which are decomposed by the action of an acid and increase solubility in an alkali developer, a compd. represented by forming I or II as a compd. generating sulfonic acid when irradiated with active light or radiation and a compd. represented by formula III. In the formulae I, II, each of R1 -R5 is H, alkyl, cycloalkyl, alkoxy, etc., and each of R6 -R8 is H, alkyl, cycloalkyl, alkenyl, etc. In the formula III, the bond between C1 and C2 (C atoms) is single or double, each of R9 and R10 is H, alkyl, etc., and R9 and R10 may form a single or multiple ring which may contain a hetero atom. |
