| 发明名称 |
Positive photoresist composition |
| 摘要 |
The present invention provides a positive photoresist composition exhibiting superior sensitivity, definition and thermostability, and in addition, having excellent focal depth range properties. The positive photoresist composition comprises (A) an alkali-soluble resin; (B) a quinonediazide group-containing compound; and (C), for example, bis(4-hydroxy-2,3,5-trimethylphenyl)-2-hydroxyphenylmethane.
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| 申请公布号 |
US5738968(A) |
申请公布日期 |
1998.04.14 |
| 申请号 |
US19970823585 |
申请日期 |
1997.03.25 |
| 申请人 |
TOKYO OHKA KOGYO CO., LTD. |
发明人 |
HOSODA, HIROSHI;HIRAYAMA, TAKU;DOI, KOUSUKE;NIIKURA, SATOSHI;KOHARA, HIDEKATSU;NAKAYAMA, TOSHIMASA |
| 分类号 |
G03F7/004;G03F7/022;H01L21/027;(IPC1-7):G03F7/023 |
主分类号 |
G03F7/004 |
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