发明名称 Photosensitive resin and method for patterning by use of the same
摘要 The invention provides a photosensitive resin which includes polymer including a group which reacts with an acid to thereby convert a polarity thereof, a photo acid generator which is responsive to radial rays to thereby generate an acid, and a solvent in which the polymer and the photo acid generator is soluble. The polymer is a terpolymer represented by a following general formula (I) wherein n represents a positive integer ranging from 5 to 1000 both inclusive, R4 is a group selected from a group consisting of a tricyclodecanyl group, a dicyclopentenyl group, a dicyclopentenyloxyethyl group, a cyclohexyl group, a norbonyl group, a norbornaneepoxy group, a norbornaneepoxymethyl group and an adamantyl group, R5 is a group selected from a group consisting of a tetrahydropyranyl group, a tetrahydrofuranyl group, a methyl group, an ethyl group, a propyl group, a tert-butyl group and 3-oxocyclohexyl group, and x+y+z=1 in which x is a variable in the range from 0.1 to 0.9 both inclusive, y is a variable in the range from 0.1 to 0.7 both inclusive, and z is a variable in the range from 0.01 to 0.7 both inclusive. <IMAGE> (I)
申请公布号 US5738975(A) 申请公布日期 1998.04.14
申请号 US19940364486 申请日期 1994.12.27
申请人 NEC CORPORATION 发明人 NAKANO, KAICHIRO;IWASA, SHIGEYUKI;HASEGAWA, ETSUO
分类号 G03F7/004;G03F7/028;G03F7/033;G03F7/038;G03F7/039;H01L21/027;(IPC1-7):G03F7/039 主分类号 G03F7/004
代理机构 代理人
主权项
地址