| 发明名称 |
ON-SITE MANUFACTURE OF ULTRA-HIGH-PURITY NITRIC ACID FOR SEMICONDUCTOR PROCESSING |
| 摘要 |
Highly purified ammonia for use in processes for the production of high-precision electronic components is prepared on-site by drawing ammonia vapor from a liquid ammonia reservoir, passing the vapor through a filter capable of filtering out particles of less than 0.005 micron in size, and scrubbing the filtered vapor in a high-pH aqueous liquid-vapor contact unit. |
| 申请公布号 |
EP0835168(A1) |
申请公布日期 |
1998.04.15 |
| 申请号 |
EP19960918226 |
申请日期 |
1996.06.05 |
| 申请人 |
STARTEC VENTURES, INC. |
发明人 |
HOFFMAN, JOE, G.;CLARK, R., SCOT;YUAN, WALLACE, I. |
| 分类号 |
C01B21/46;B01D1/00;B01D3/00;B01D3/02;B01D3/14;B01J39/04;B08B7/04;C01B7/07;C01B7/19;C01B15/013;C01C1/02;C01C1/16;F26B7/00;H01L21/304;H01L21/306;H01L21/311 |
主分类号 |
C01B21/46 |
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