| 摘要 |
PROBLEM TO BE SOLVED: To provide an underwater loader which is capable of preventing contamination of wafer. SOLUTION: A water bath 11 in which a cassette, holding a wafer is immersed is provided with movable dam members 17A, 17B, 17C and 17D on the four upper sides. Multiple notches N are formed with predetermined spaces on the upper side of the movable dam members 17A-17D. The movable dam members 17A-17D are mounted on the water bath 11 with the vertical position of their ends being adjustable. Accordingly, the vertical position of the notches N can be adjusted, and the water in the water bath 11 can be overflowed in four directions. Slurry floating on the water surface can be removed by the overflow. Slurry in the water can be also removed by draining water through an inlet/outlet 15 of water, provided in the bottom of the water bath 11. Slurry deposited on inner walls of the water bath 11 can be also removed by a jet of cleaning water from nozzles 91A and 91B, provided on the side walls of the water bath 11. |
