发明名称 Position measuring system
摘要 A position measuring system having an illuminating device for generating a beam of light. A graduation support is provided with a graduation and a reference marker with a first set of graduation markings, where the graduation support receives the beam of light and generates a second beam of light. A scanning plate moves along a measuring direction and receives the second beam of light and generates a third beam of light, wherein the scanning plate has a second set of graduation markings for scanning the first set of graduation markings of the reference marker. A first photodetector and a second photodetector receive portions of the third beam of light and generate position-dependent electrical signals, wherein either the first set of graduation markings of the reference marker or the second set of graduation markings have a structure which deflects in the measuring direction.
申请公布号 US5739911(A) 申请公布日期 1998.04.14
申请号 US19960679201 申请日期 1996.07.12
申请人 DR. JOHANNES HEIDENHAIN GMBH 发明人 HOLZAPFEL, WOLFGANG;HUBER, WALTER
分类号 G01B11/00;G01B21/02;G01D5/38;(IPC1-7):G01B11/00 主分类号 G01B11/00
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