发明名称 VACUUM EVAPORATION OF DIAMOND THIN LAYER OF HIGH ADHESION
摘要 PROBLEM TO BE SOLVED: To reliably evaporate a polycrystalline diamond thin layer of high transparency on the substrate with high adhesion by arranging a prescribed substrate near the plasma for diamond thin layer evaporation and generating a specific plasma. SOLUTION: A substrate, preferably made of glass, more preferably of borosilicate glass is polished with diamond particles of 0.05-1μparticle sizes, or uniformly coated with diamond particles of about 0.05-1μparticle sizes, then arranged near the diamond plasma for thin layer evaporation and a plasma which contains a gas mixture mainly comprises hydrogen and methane, when necessary, carbon dioxide is generated under a pressure of 1-15Torr.
申请公布号 JPH1095694(A) 申请公布日期 1998.04.14
申请号 JP19960212635 申请日期 1996.08.12
申请人 UNIV MICHIGAN STATE 发明人 MAIKL J URKJINSKY;DONY K LANEHURD;JESS ASMUSSEN
分类号 C30B29/04;C23C16/26;C23C16/27;C23C16/452;C23C16/50;H01L21/205;(IPC1-7):C30B29/04 主分类号 C30B29/04
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