| 发明名称 |
Active shield for generating a plasma for sputtering |
| 摘要 |
<p>A combination coil and shield (104) for a plasma chamber (100) in a semiconductor fabrication system is provided. The coil-shield has a plurality of turns to couple energy efficiently into a plasma and also substantially blocks deposition material from reaching a second shield (106) positioned behind the first shield. <IMAGE></p> |
| 申请公布号 |
EP0836218(A2) |
申请公布日期 |
1998.04.15 |
| 申请号 |
EP19970307864 |
申请日期 |
1997.10.06 |
| 申请人 |
APPLIED MATERIALS, INC. |
发明人 |
EDELSTEIN, SERGIO;SUBRAMANI, MANI |
| 分类号 |
C23C14/00;C23C14/34;H01J37/32;H01J37/34;H01L21/02;H01L21/203;H01L21/285;(IPC1-7):H01J37/34 |
主分类号 |
C23C14/00 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
