| 摘要 |
<p>PROBLEM TO BE SOLVED: To reduce the weight of an original plate stage and to improve throughput and exposure precision by employing a configuration where a fine moving mechanism for alignment of original plate/position is not placed on the original plate stage. SOLUTION: Relating to the device, a reticule alignment mechanism is not placed on a reticule stage 1 but set separately, so that the weight of reticule stage 1 is reduced, to speed up scanning and to improve throughput. When the reticule stage 1 comes to a reticule alignment position at reticule alignment, a reticule handler 36 falls and a reticule 34 is vacuum-sucked with a reticule sucking pad 53 attached to a lower end of rising/falling axis 51 of the reticule handler 36 through a leaf spring 52. Then, the vacuum of a reticule chuck 56 on the reticule stage 1 is converted into air blow, and the reticule 34 is made to soar by a small amount from the reticule chuck 56 by an air flow. Under this condition, displacement is detected.</p> |
