| 摘要 |
<p>A liquid vaporizer apparatus (40) and method for chemical vapor deposition of liquid solutions into a controlled atmosphere of a CVD reaction chamber (50). The apparatus comprises an atomizer (24), gas curtain (27), heated porous media disks (52, 54, 56) and a carrier gas mixer. The invention provides for the independent control of temperature, pressure and precursor stoichiometry during the atomizing and vaporization process thereby rendering the precise precursor vapor quality and quantity required for a given application. The invention employs the use of removable porous media disks (52, 54, 56) which may be varied according to the desired operating pressure and precursors. In operation, the apparatus provides for a liquid precursor to first be atomized into a mist using an ultrasonic nozzle, then vaporized by heated media disks (52, 54, 56), and mixed with a carrier gas, then forced into the CVD reaction chamber (50).</p> |
