| 发明名称 |
PROCESS FOR PRODUCING SPUTTERING TARGET |
| 摘要 |
<p>A process for producing sputtering targets, which comprises molding a mixture of a powder of a high-melting substance having a melting point of 900 DEG C or above with a powder of a low-melting metal having a melting point of 700 DEG C or below at a temperature below the melting point of the low-melting metal under heat and pressure. <IMAGE></p> |
| 申请公布号 |
EP0834594(A1) |
申请公布日期 |
1998.04.08 |
| 申请号 |
EP19960915180 |
申请日期 |
1996.05.17 |
| 申请人 |
ASAHI GLASS COMPANY LTD. |
发明人 |
NAKAGAMA, SUSUMU;HIGETA, MASAO;HAYASHI, ATSUSHI |
| 分类号 |
C23C14/34;(IPC1-7):C23C14/34 |
主分类号 |
C23C14/34 |
| 代理机构 |
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