| 摘要 |
<p>A cerium oxide abrasive for abrading surfaces of an SiO2 insulating film or the like film without causing defects and at high speeds. The abrasive includes a slurry obtained by dispersing, in a medium, the cerium oxide particles having diameters of primary particles of from 10 to 600 nm, a median value of 30 to 250 nm, a median value of particle diameters of 150 to 600 nm, and a maximum diameter of not larger than 3000 nm.</p> |
