发明名称 |
Method and arrangement for drying substrates |
摘要 |
A method of drying substrates, especially silicon wafers, involves irradiation with IR and UV. Also claimed is an apparatus for carrying out the above method, in which (i) relative motion is produced between the substrate and one or more emitters or (ii) the substrate is irradiated by one or more emitters having a radiation emission face matching the peripheral shape of the substrate. |
申请公布号 |
EP0834908(A1) |
申请公布日期 |
1998.04.08 |
申请号 |
EP19970890193 |
申请日期 |
1997.09.23 |
申请人 |
SEZ SEMICONDUCTOR-EQUIPMENT ZUBEHOER FUER DIE HALBLEITERFERTIGUNG AG |
发明人 |
KRUWINUS, HANS-JUERGEN, DIPL.-ING. |
分类号 |
F26B3/28;H01L21/00;H01L21/304 |
主分类号 |
F26B3/28 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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