发明名称 Positive-working radiation-sensitive mixture and recording material produced therewith
摘要 The invention relates to a positive-working radiation-sensitive mixture containing a) a compound which forms acid when exposed to actinic radiation, b) a compound containing at least one C-O-C or C-O-Si bond which can be cleaved by said acid, and c) a water-insoluble polymeric binder which is soluble, or at least swellable, in aqueous alkaline solutions, wherein the compound a) comprises the structure of the formulae I, II or III: <IMAGE> (I)ensitive mixture according to the invention is notable for a high resolution and a high sensitivity over a wide spectral range. It also has high thermal stability and does not form any corrosive photolysis products on exposure to light. The invention furthermore relates to a radiation-sensitive recording material produced therefrom which is suitable for producing photoresists, electronic components, printed circuit boards or for chemical milling.
申请公布号 US5736297(A) 申请公布日期 1998.04.07
申请号 US19960681081 申请日期 1996.07.22
申请人 CLARIANT GMBH 发明人 ROESCHERT, HORST;PAWLOSKI, GEORG
分类号 C07D271/12;G03F7/004;G03F7/039;H01L21/027;(IPC1-7):G03C1/73 主分类号 C07D271/12
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