RIM TYPE PSM FABRICATION METHOD

摘要

A fabrication method of rim-shaped phase shift mask is provided to improve an yield and a reproduction. The method comprises the steps of: forming a chrome pattern(7') and a phase shifting pattern(8') on a quartz substrate(3); forming a PR pattern(9) for exposing the portion of the chrome pattern(7'); forming grooves(10) by etching the chrome pattern(7') and the phase shifting pattern(8') using the PR pattern(9) as a mask; depositing a chrome layer(11) on the resultant structure; etching the PR pattern(9) using an etching end point(12), thereby opening the phase shifting pattern(8') and remaining the chrome pattern(11) in the bottom of groove(10). Thereby, it is possible to easily form the rim-shaped phase shift mask.