发明名称 COMPOSITION FOR GRINDING USE
摘要 PROBLEM TO BE SOLVED: To obtain the subject composition comprising silicon nitride fine powder, water and fumed titania or the like, capable of reducing the speed of grinding a silicon nitride film without impairing its characteristics, and easy in redispersibilitV of precipitates developed even after stored over a long period. SOLUTION: This composition for grinding use comprises (A) silicon nitride fine powder, water, and (B) fumed titania or fumed zirconia, and pref. furthermore, an acid pref. an organic acid such as carboxylic acid (esp. gluconict acid, lactic acid or citric acid) or inorganic acid such as hydrochloric or nitric acid]. It is preferable that the average partictle size of the component A is 0.01-10&mu;m and the content of the component B is 0.0002-50,000wt.% based on the component A and <=50wt.% based on the whole composition.
申请公布号 JPH1088112(A) 申请公布日期 1998.04.07
申请号 JP19960243421 申请日期 1996.09.13
申请人 FUJIMI INKOOPOREETETSUDO:KK 发明人 KODAMA KAZUSHI;MIURA SHIRO;OTAKE HIDEKI;KAWAMURA ATSUNORI;ITOU SANETOKI
分类号 B24B37/00;C09K3/14 主分类号 B24B37/00
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