发明名称 POLISHING AMOUNT MEASURING DEVICE
摘要 PROBLEM TO BE SOLVED: To measure accurately the polishing amount of an object to be polished by measuring the position of the rear side of a polishing standard relative to the position of the rear side of an object to be polished. SOLUTION: A polishing amount measuring device which is used for an apparatus which polishes an object to be polished 1 by contacting the object 1 with a polishing cloth 4 placed on a surface plate 3 and causing the object 1 to perform a relative motion comprises polishing amount measuring means 18 and 19 which measure the polishing amount of a polishing standard 8 which is polished together with an object to be polished 1 on the polishing cloth 4 and position measuring means 14, 15 and 16 which measure the relative positions of the rear side of the object to be polished 1 and that of the polishing standard 8, and measures the polishing amount of the object to be polished from the polishing amount of the polishing standard 8 and the relative positions of the rear side of the object to be polished 1 and that of the polishing standard 8.
申请公布号 JPH1086060(A) 申请公布日期 1998.04.07
申请号 JP19960245203 申请日期 1996.09.17
申请人 NIKON CORP 发明人 IWASAKI YUTAKA
分类号 B24B49/00;H01L21/304 主分类号 B24B49/00
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