| 摘要 |
<p>PROBLEM TO BE SOLVED: To obtain a coating treatment method for a photosensitive resist by which firstly the photosensitive resist is surely applied on the inside walls of through-holes, secondly the photosensitive resist is thickly applied near the corners of the opening edges of the through-holes, thirdly the clogging of the through-holes is eliminated, fourthly the film thickness of the photosensitive resist is made uniform and fifthly these operations are simply and easily embodied excellently in terms of costs and a coating treating device therefor. SOLUTION: This coating treatment method and coating treating device 9 for the photosensitive resist A lower the printed circuit board martial 5 hung and held in a vertical state B by a holding mechanism 11 and immerse this material by a lifting mechanism into the liquid tank 6 of the photosensitive resist A and pulling up the material after applying vibration thereon in an excitation section 14, then turning the material upside down in the vertical state B. Further, the printed circuit board martial 5 is held in a horizontal state C, is turned inside out and is dried in a drying section 15. The respective stages are executed while the printed circuit board martial is transported by a transporting mechanism 12 rotating around a slide shaft 24.</p> |
